SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance

Seiji Nagahara; Kazuyuki Yoshimochi; Hiroshi Yamazaki; Kazuhiro Takeda; Takayuki Uchiyama; Stephen Hsu; Zhipan Li; Hua-yu Liu; Keith Gronlund; Terunobu Kurosawa; Jun Ye; Luoqi Chen; Hong Chen; Zheng Li; Xiaofeng Liu; Wei Liu

doi:10.1117/12.846473

12 March 2010 SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance

Seiji Nagahara, Kazuyuki Yoshimochi, Hiroshi Yamazaki, Kazuhiro Takeda, Takayuki Uchiyama, Stephen Hsu, Zhipan Li, Hua-yu Liu, Keith Gronlund, Terunobu Kurosawa, Jun Ye, Luoqi Chen, Hong Chen, Zheng Li, Xiaofeng Liu, Wei Liu

Author Affiliations +

Proceedings Volume 7640, Optical Microlithography XXIII; 76401H (2010) https://doi.org/10.1117/12.846473
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper investigates the application of source-mask optimization (SMO) techniques for 28 nm logic device and beyond. We systematically study the impact of source and mask complexity on lithography performance. For the source, we compare SMO results for the new programmable illuminator (ASML's FlexRay) and standard diffractive optical elements (DOEs). For the mask, we compare different mask-complexity SMO results by enforcing the sub-resolution assist feature (SRAF or scattering bar) configuration to be either rectangular or freeform style while varying the mask manufacturing rule check (MRC) criteria. As a lithography performance metric, we evaluate the process windows and MEEF with different source and mask complexity through different k₁ values. Mask manufacturability and mask writing time are also examined. With the results, the cost effective approaches for logic device production are shown, based on the balance between lithography performance and source/mask (OPC/SRAF) complexity.

Citation Download Citation

Seiji Nagahara, Kazuyuki Yoshimochi, Hiroshi Yamazaki, Kazuhiro Takeda, Takayuki Uchiyama, Stephen Hsu, Zhipan Li, Hua-yu Liu, Keith Gronlund, Terunobu Kurosawa, Jun Ye, Luoqi Chen, Hong Chen, Zheng Li, Xiaofeng Liu, and Wei Liu "SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance", Proc. SPIE 7640, Optical Microlithography XXIII, 76401H (12 March 2010); https://doi.org/10.1117/12.846473

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available