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3 March 2010Advances in DOE modeling and optical performance for SMO
The introduction of source mask optimization (SMO) to the design process addresses an urgent need for the 32nm node
and beyond as alternative lithography approaches continue to push out. To take full advantage of SMO routines, an
understanding of the characteristic properties of diffractive optical elements (DOEs) is required. Greater flexibility in the
DOE output is needed to optimize lithographic process windows. In addition, new and tighter constraints on the DOEs
used for off-axis illumination (OAI) are being introduced to precisely predict, control and reduce the effects of pole
imbalance and stray light on the CD budget. We present recent advancements in the modeling and optical performance
of these DOEs.
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James Carriere, Jared Stack, John Childers, Kevin Welch, Marc D. Himel, "Advances in DOE modeling and optical performance for SMO applications," Proc. SPIE 7640, Optical Microlithography XXIII, 764025 (3 March 2010);