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12 March 2010 Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA
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Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest methods such as source mask optimization (SMO) and inverse lithography technology (ILT) are gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this paper, we demonstrate that our previously proposed Abbe-PCA is highly efficient for source configuring and pixel-based ILT mask tuning.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, and Lawrence S. Melvin III "Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA", Proc. SPIE 7640, Optical Microlithography XXIII, 764026 (12 March 2010);


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