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3 March 2010 Source-mask optimization (SMO): from theory to practice
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Source Mask Optimization techniques are gaining increasing attention as RET computational lithography techniques in sub-32nm design nodes. However, practical use of this technique requires careful considerations in the use of the obtained pixilated or composite source and mask solutions, along with accurate modeling of mask, resist, and optics, including scanner scalar and vector aberrations as part of the optimization process. We present here a theory-to-practice case of applying ILT-based SMO on 22nm design patterns.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thuc Dam, Vikram Tolani, Peter Hu, Ki-Ho Baik, Linyong Pang, Bob Gleason, Steven D. Slonaker, and Jacek K. Tyminski "Source-mask optimization (SMO): from theory to practice", Proc. SPIE 7640, Optical Microlithography XXIII, 764028 (3 March 2010);

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