10 March 2010 Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography
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ArF immersion technology is spotlighted as the enabling technology for the 45nm node and beyond. Recently, double exposure technology is also considered as a possible candidate for the 32nm node and beyond. We have already released an injection lock ArF excimer laser, the GT61A (60W/6kHz/10mJ/0.30pm) with ultra line-narrowed spectrum and stabilized spectrum performance for immersion lithography tools with N.A.>1.3, and we have been monitoring the field reliability data of our lasers used in the ArF immersion segment since Q4 2006. In this report we show field reliability data of our GigaTwin series - twin chamber ArF laser products. GigaTwin series have high reliability. The availability that exceeds 99.5% proves the reliability of the GigaTwin series. We have developed tunable and high power injection-lock ArF excimer laser for double patterning, GT62A (Max90W/6000Hz/Tunable power with 10-15mJ/0.30pm (E95)) based on the GigaTwin platform. A number of innovative and unique technologies are implemented on GT62A. - Support the latest illumination optical system - Support E95 stability and adjustability - Reduce total cost (Cost of Consumables, Cost of Downtime and Cost of Energy & Environment)
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaya Yoshino, Masaya Yoshino, Hiroshi Umeda, Hiroshi Umeda, Hiroaki Tsushima, Hiroaki Tsushima, Hidenori Watanabe, Hidenori Watanabe, Satoshi Tanaka, Satoshi Tanaka, Shinich Matsumoto, Shinich Matsumoto, Takashi Onose, Takashi Onose, Hiroyuki Nogawa, Hiroyuki Nogawa, Yasufumi Kawasuji, Yasufumi Kawasuji, Takashi Matsunaga, Takashi Matsunaga, Junichi Fujimoto, Junichi Fujimoto, Hakaru Mizoguchi, Hakaru Mizoguchi, } "Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography", Proc. SPIE 7640, Optical Microlithography XXIII, 76402A (10 March 2010); doi: 10.1117/12.846337; https://doi.org/10.1117/12.846337


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