3 March 2010 Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design
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Abstract
Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.
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Jue-Chin Yu, Jue-Chin Yu, Peichen Yu, Peichen Yu, } "Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design", Proc. SPIE 7640, Optical Microlithography XXIII, 76402L (3 March 2010); doi: 10.1117/12.846568; https://doi.org/10.1117/12.846568
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