3 April 2010 Library-based performance-based OPC
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Proceedings Volume 7641, Design for Manufacturability through Design-Process Integration IV; 76410X (2010); doi: 10.1117/12.846469
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States
Abstract
Conventional geometrical EPE-based OPC approach often results in complicated mask and requires expensive computational effort. To address the mask complexity issue, a device performance-based OPC (DPB-OPC) algorithm which operates based on parametric current, rather than desired layout pattern as in conventional OPC, has been proposed to achieve considerable mask data saving. However, the performance gain is currently limited by the comparatively longer run-time. To improve run-time efficiency of the previous work, we present a library-based DPBOPC methodology in the paper. In particular, cell-wise OPC concept is deployed to explore its merit of run-time saving. To counteract the performance degradation shift that caused by different surrounding environment, a localized DPBOPC refinement can be selectively performed. When compared to full chip OPC, substantial run-time reduction is achieved in the benchmark design.
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Siew-Hong Teh, Chun-Huat Heng, Arthur Tay, "Library-based performance-based OPC", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 76410X (3 April 2010); doi: 10.1117/12.846469; https://doi.org/10.1117/12.846469
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KEYWORDS
Optical proximity correction

Photomasks

Ions

Transistors

Databases

Device simulation

Lithography

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