3 April 2010 A GPU-based full-chip inverse lithography solution for random patterns
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Proceedings Volume 7641, Design for Manufacturability through Design-Process Integration IV; 764115 (2010); doi: 10.1117/12.846638
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States
Abstract
An inverse lithography solution based on optimization is presented. The optimization approach, in effect, operates as an inverse lithography tool, based on modeling and simulation of the manufacturing process. Given the associated computational requirements, the proposed solution intentionally uses graphic processors (GPUs) as well as CPUs as computation hardware. Due to the approach we employed, the results are optimized towards manufacturability and process window maximization.
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Ilhami Torunoglu, Ahmet Karakas, Erich Elsen, Curtis Andrus, Brandon Bremen, Boris Dimitrov, Jeffrey Ungar, "A GPU-based full-chip inverse lithography solution for random patterns", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 764115 (3 April 2010); doi: 10.1117/12.846638; https://doi.org/10.1117/12.846638
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KEYWORDS
Photomasks

Lithography

Manufacturing

Process modeling

Semiconducting wafers

Logic

3D modeling

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