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2 April 2010 A GPU-based full-chip inverse lithography solution for random patterns
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An inverse lithography solution based on optimization is presented. The optimization approach, in effect, operates as an inverse lithography tool, based on modeling and simulation of the manufacturing process. Given the associated computational requirements, the proposed solution intentionally uses graphic processors (GPUs) as well as CPUs as computation hardware. Due to the approach we employed, the results are optimized towards manufacturability and process window maximization.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ilhami Torunoglu, Ahmet Karakas, Erich Elsen, Curtis Andrus, Brandon Bremen, Boris Dimitrov, and Jeffrey Ungar "A GPU-based full-chip inverse lithography solution for random patterns", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 764115 (2 April 2010);


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