9 September 2010 Toward the global optimum in lithographic lens design
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Proceedings Volume 7652, International Optical Design Conference 2010; 76522B (2010) https://doi.org/10.1117/12.868530
Event: International Optical Design Conference 2010, 2010, Jackson Hole, WY, United States
Abstract
Significant advances have been made in recent years in the development of lithography optics. The resolution of structures smaller than 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best-performing lens types and design principles of the catadioptric concept of these lenses.
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Aurelian Dodoc, "Toward the global optimum in lithographic lens design", Proc. SPIE 7652, International Optical Design Conference 2010, 76522B (9 September 2010); doi: 10.1117/12.868530; https://doi.org/10.1117/12.868530
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