13 October 2010 Sub-aperture stitching with scanning pentaprism testing optical wave-front
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Proceedings Volume 7654, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes; 76540Y (2010) https://doi.org/10.1117/12.867081
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
This paper describes a pentaprism scanning combined with sub-aperture stitching interference method to test large aperture optical system wave-front. This method uses pentaprism scanning and interferometer testing sub-aperture optical system wave-front, after testing all the sub-aperture wave-front and then using average error stitching algorithm to reconstruction full-aperture optical system wave-front. It makes use of the pentaprism easily to adjust and interferometer's high-precision characteristic. Analyzed the mechanical precision of turntable and electric guide, when the turntable sway angle is less than 8', location accuracy is less than 1.194' and the electric guide linearity is less than 8'location accuracy is less than 83.3μm, can meet the testing requirements. We used 40mm sub-aperture testing 312mm full aperture wave-front PV is 0.2197λ and RMS is 0.0536λ. Compared the stitching results with Zygo interferometer directly full aperture testing verified the accuracy of the method and provides a new idea for testing a large aperture optical wave-front.
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Lihua Wang, Lihua Wang, Wei Yang, Wei Yang, Lei Li, Lei Li, Shibin Wu, Shibin Wu, Zhaohen Lin, Zhaohen Lin, } "Sub-aperture stitching with scanning pentaprism testing optical wave-front", Proc. SPIE 7654, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 76540Y (13 October 2010); doi: 10.1117/12.867081; https://doi.org/10.1117/12.867081
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