6 October 2010 IBF technology for nanomanufacturing technology
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Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 765513 (2010) https://doi.org/10.1117/12.883031
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
Ultra precise figure error correction of optics whether down to the sub-nm RMS level or time-saving with nm-RMS accuracy by using three axes IBF-plants.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Franz, T. Hänsel, "IBF technology for nanomanufacturing technology", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765513 (6 October 2010); doi: 10.1117/12.883031; https://doi.org/10.1117/12.883031
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