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6 October 2010 Design of multilayer grating in VUV spectrum by rigorous coupled-wave method
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Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 76551O (2010) https://doi.org/10.1117/12.866135
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
The rigorous coupled-wave method (RCWM) is extended to calculate the diffraction efficiency of multilayer grating in spectrum with strong absorption. This paper gives a detailed algorithm analysis of the RCWM, an enhanced, numerically stable transmittance matrix approach applied to homogenous layered media is generalized for multilayer grating structure. In order to calculate in the lossy medium, the wave vector of electric field is redefined. This method is programmed to design multilayer grating which is expected to use on Seya-Namioka synchrotron monochromator in vacuum ultraviolet (VUV) spectrum. The influence on diffraction efficiency caused by grating profile and multilayer stack is analyzed theoretically. The diffraction efficiencies of well-designed multilayer gratings are all greater than 10% in 50-110nm region, and they are about two to three times higher than that of the single metallic layer grating which is being used on Seya-Namioka monochromator now.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shengnan He, Ying Liu, Huoyao Chen, Keqiang Qiu, and Shaojun Fu "Design of multilayer grating in VUV spectrum by rigorous coupled-wave method", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76551O (6 October 2010); https://doi.org/10.1117/12.866135
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