11 October 2010 Uniform illumination for large area digital speckle pattern interferometry using multibeam
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Abstract
Using Digital Speckle Pattern Interferometry (DSPI) method measuring the large object in practice, the primarily problem is uniform illumination. This paper presents a method that using multiple laser beams to enlarge the illumination area and analysis the non-uniform illumination influences for interferogram. We design an illumination model using 10 semiconductor lasers for interferometer, and corresponding experiment shows that this method is suitable for industrial measurement in large area detection.
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Zhanhua Huang, Zhanhua Huang, Meng Zhu, Meng Zhu, Huaiyu Cai, Huaiyu Cai, Yinxin Zhang, Yinxin Zhang, } "Uniform illumination for large area digital speckle pattern interferometry using multibeam", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765614 (11 October 2010); doi: 10.1117/12.865157; https://doi.org/10.1117/12.865157
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