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11 October 2010 Research on stitching interferometry aspheric surface with correcting systemic aberration
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Sub-aperture stitching interferometry was originally used for measurement of large-diameter plane and spherical, it is a technological means that uses small-caliber interferometer to test each parts of optical component, and then all the subaperture data are combined or stitched together to create a map of the full surface. Correcting adjust errors of three directions is currently stitching algorithm for realizing the stitching testing aspheric surface. But without spatial analysis for bias errors of positioning mechanism, we can't know exactly the actual appearance of bias errors, consequently will not be able to implement a accuracy stitching.. Because the accuracy of individual stitching can't meet the accuracy requirements, the test result of stitching interferometry aspheric surface will not meet requirements of accuracy due to the errors accumulation. Correcting systemic aberration method is presented to solve the problem mentioned above. It is based on the analysis of the actual impact appearance of location components' bias error in interferometry. The actual appearance is exactly the same after comparing with the Seidle aberration. a correction bias errors model of stitching measure is found based on the analysis, and it proposed an accuracy stitching measurement for quadric surface measurement. It gets the stitching coefficients with least square fitting method, and acquires the estimate values of bias errors in sub-aperture stitching components, and corrects the high-order systemic aberration, therefore improve the fitting accuracy in sub-apertures overlap zone. The experiment result shows, the stitching accuracy of this stitching method is higher than traditional stitching method.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yujing Qiao and Guihua Han "Research on stitching interferometry aspheric surface with correcting systemic aberration", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765633 (11 October 2010);


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