Monitor the nanometer scale thickness change of optical thin film

Yuxiao Yang; Zhengli Dai; Lei Wang

doi:10.1117/12.864438

11 October 2010 Monitor the nanometer scale thickness change of optical thin film

Yuxiao Yang, Zhengli Dai, Lei Wang

Proceedings Volume 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 76563N (2010) https://doi.org/10.1117/12.864438
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

In this paper, the nanometer scale change of optical thickness is detected in real time depend upon the spectrum phase shift of white-light interference resulted in two interface of thin film. The setup and the spectrum signal processing software are introduced. The filter is designed through analyzing the noise features of the reflect spectrum signal gathered from the system. It is proved that a wave-let filter is the most effective method in filter noise. Error of the signal processing is discussed in the end. Due to this study, the software, which is used to real-time monitor the nanometer scale thickness change of thin film, is developed. Experiments show that the system has high sensitivity, high precision, lower cost and working on a high reliability.

Citation Download Citation

Yuxiao Yang, Zhengli Dai, and Lei Wang "Monitor the nanometer scale thickness change of optical thin film", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76563N (11 October 2010); https://doi.org/10.1117/12.864438

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