12 October 2010 Analysis of the effects on ultra-short laser pulse beam quality caused by errors in optical systems
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Abstract
The quality of the ultra-short laser pulse need to be controlled in applications. In this paper, the effects on ultra-short laser pulse beam quality caused by surface errors and assembly errors in real optical systems is analyzed in a microscope objective system. Zernike polynomials are used to describe the surface errors and error limit is set for the tilt and decenter in assembly. When coming to calculations, we firstly take samples from the incident laser pulse and decompose it into different frequency components; then we use ray-tracing combing with diffraction integral from the exit pupil to the focal plane for calculation. According to the result of the calculation and analysis, we can reasonably control the surface errors and assembly errors in the microscope object system.
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Hong-bo Shang, Hong-bo Shang, Zhao-feng Cen, Zhao-feng Cen, Xiao-tong Li, Xiao-tong Li, Qiang-sheng Liu, Qiang-sheng Liu, } "Analysis of the effects on ultra-short laser pulse beam quality caused by errors in optical systems", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76564X (12 October 2010); doi: 10.1117/12.866868; https://doi.org/10.1117/12.866868
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