Nano-patterns fabricated by soft press and temperature-pressure variation imprint

Lei Wang; Wen Liu; Yiwen Zhang; Fei Qiu; Dingli Wang; Ning Zhou; Zhimou Xu

doi:10.1117/12.867573

22 October 2010 Nano-patterns fabricated by soft press and temperature-pressure variation imprint

Lei Wang, Wen Liu, Yiwen Zhang, Fei Qiu, Dingli Wang, Ning Zhou, Zhimou Xu

Proceedings Volume 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 765706 (2010) https://doi.org/10.1117/12.867573
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein, temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.

Citation Download Citation

Lei Wang, Wen Liu, Yiwen Zhang, Fei Qiu, Dingli Wang, Ning Zhou, and Zhimou Xu "Nano-patterns fabricated by soft press and temperature-pressure variation imprint", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765706 (22 October 2010); https://doi.org/10.1117/12.867573

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