22 October 2010 Fast, high efficiency and cost-effective laser nano-lithography
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Abstract
The main advantageous features of laser interference lithography (LIL) technology in fabrication of nano structures and devices are high resolution, low cost and high efficiency. By using LIL, the graded-index patterns consist of periodic modified lines (MLs) on the periodic square patterns. Patterns with MLs formed on SiO2 deposited on GaAs substrate. The orientation and periodicity of MLs are shown to depend on the configuration of the incident laser beams. Periodic arrays of holes in GaAs, covered with SiO2 bubbles, were directly written into the sample within only some minutes. The diameters of the smallest holes were less than 30 nm. The smallest modification features of the GaAs were less than 5 nm. Four-beam LIL was shown to be a good technology to generate graded-index photonic crystals with square lattice. High intensity enhancement and sub-wavelength focusing were achieved simultaneously. The results indicate a new lowcost and high-efficiency way of fabricating planar lens.
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C. S. Peng, C. S. Peng, C. Tan, C. Tan, } "Fast, high efficiency and cost-effective laser nano-lithography", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765708 (22 October 2010); doi: 10.1117/12.867965; https://doi.org/10.1117/12.867965
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