Research on exposure model for DMD-based digital gray-tone mask

Ningning Luo; Yiqing Gao; Shuai He; Yufang Rao

doi:10.1117/12.865232

22 October 2010 Research on exposure model for DMD-based digital gray-tone mask

Ningning Luo, Yiqing Gao, Shuai He, Yufang Rao

Proceedings Volume 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 765712 (2010) https://doi.org/10.1117/12.865232
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

Based on DMD-lithography system, the mapping relation between gray scale and photoresist relief has been investigated. We obtain DMD reflectivity of different gray scale by experiment. Testing curve shows the light modulation of DMD is nonlinear from 0 to 255. However, the testing curve shows local linearization as well. The modulation of DMD is approximately linear from 40 to 130 and from 160 to 230. When designing the gray-scale mask, we should choose the gray scales in the same linear region to satisfy the requirement of multi-step relief. After being modulated by DMD, the reflection with mask information passes through the reduction projection system and images on the photoresist. After development, the photoresist relief can be formed. By comprehensively considering the influence of all parts on lithography, the exposure model is set up. We calculate the gray tones of 4-step and 8-step elements respectively according to the model. Experimental results show that the exposure model is reasonable and correct. The establishment of exposure model has reference value for the precise control on relief depth.

Citation Download Citation

Ningning Luo, Yiqing Gao, Shuai He, and Yufang Rao "Research on exposure model for DMD-based digital gray-tone mask", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765712 (22 October 2010); https://doi.org/10.1117/12.865232

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