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22 October 2010 Methods of eliminating the grid effect based on DMD technique of maskless lithography
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Abstract
The three novel methods of eliminating the grid effect caused by space duty cycle of Digital Micromirror Device (DMD) based on the DMD technique of maskless lithography are proposed, which are limiting the numerical aperture of projection objective, utilizing diffractive optical element arrays and using phase controlled beam shaping elements arrays. The physical mechanism of the grid effect is studied. The principles of three methods are analyzed and the experimental project about limiting the numerical aperture of projection objective, diffractive optical element arrays and phase controlled beam shaping elements arrays are proposed. The experimental results are given and the similarities and differences of the three methods are compared and analyzed. The experimental results indicate that these three methods can clear up the grid effect caused by space duty cycle of DMD. The research results will provide the references for improving the quality of maskless lithography device.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yanli Li, Wei Yan, Jian Wang, Yong Yang, and Lixin Zhao "Methods of eliminating the grid effect based on DMD technique of maskless lithography", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765716 (22 October 2010); https://doi.org/10.1117/12.866809
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