22 October 2010 Nanolithography in the evanescent near-field by using gain-assisted meta-materials system
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Abstract
Surface Plasmon polaritons are electromagnetic waves that propagate along the surface of a conductor, usually a metal. It is shown that the gain-assisted metamaterial can compensate for the intrinsic absorption loss in metal. In this paper, the propagation of surface plasmon polaritons on gain-assist metamaterial system is investigated. As an example, nanolithography has been considered by using optical proximity exposure in the evanescent near field of gain-assisted metamaterial layer. The evanescent waves carried the detailed information of the object which was defined by the high space frequency of the mask. With the enhancement of surface plasmon polaritons and gain-assisted metamaterials system, the evanescent waves can be propagated to a relatively far distance. Numerical computations by finite element analysis shows that better optimization of the gain-assisted metamaterials system can further improve the resolution. Experiments will be developed to prove the simulation by using a modified i-line aligner. The computation result shows it will be an alternative nanolithography technique for the next generation lithography.
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Yong Yang, Yong Yang, Wei Yan, Wei Yan, Jian Wang, Jian Wang, Yanli Li, Yanli Li, Lixin Zhao, Lixin Zhao, Song Hu, Song Hu, Zhan Li, Zhan Li, } "Nanolithography in the evanescent near-field by using gain-assisted meta-materials system", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571C (22 October 2010); doi: 10.1117/12.866808; https://doi.org/10.1117/12.866808
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