22 October 2010 Design and simulation for the bifocal microlens in thick film lithography
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Abstract
The bifocal microlens are novel optical components, which have the capability of producing two focal points along optical axis. They have potential application in readout of dual-layer disks, optical tweezer, optical coherence tomography and microfluidic system. In this paper, the design for the bifocal microlens has been presented. The distortion of the pattern transfer process in the thick film lithography has been analyzed. The modified grayscale mask method has been introduced to compensate the distortion of the pattern transfer process. The simulation for fabrication of the bifocal microlens in the thick film lithography has been performed, which shows that the simulated profile is closely consistent with the designed one. Through our proposed method, the bifocal microlens with high profile quality can be obtained, and consequently this can greatly improve its optical performance. Furthermore, the fabrication process is relatively easy and the cost is low, which is favorable to the future application of the bifocal microlens.
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Xionggui Tang, Xionggui Tang, Rongguo Lu, Rongguo Lu, Jinkun Liao, Jinkun Liao, Heping Li, Heping Li, Lin Zhang, Lin Zhang, Yongzhi Liu, Yongzhi Liu, } "Design and simulation for the bifocal microlens in thick film lithography", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571S (22 October 2010); doi: 10.1117/12.865995; https://doi.org/10.1117/12.865995
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