In this investigation, a novel heat-sensitive material titanium oxide (TiOx) thin film was deposited on well cleaned K9 glass substrates by d.c. reactive magnetron sputtering from a metallic titanium target in an Ar + O2 gas mixture. In order to obtain proper TiOx thin films, deposition parameters should be properly controlled. In our system, TiOx thin films were obtained at different substrate temperature while total pressure and oxygen partial pressure were kept at 1 Pa and 0.6 Pa, d.c. power of 100 W, and the deposition time was adjusted in order to deposit thin films with a constant thickness close to 200 nm. The crystalline structure was characterized by X-ray diffraction (XRD) analysis and the results show that all the deposited films have an amorphous structure. In this paper, we have mainly investigated the dependence of electrical and optical properties of the reactively sputtered TiOx thin films on the different substrate temperature during the sputtering process, i.e., as the K9 glass substrate temperature increases from 100 °C to 250°C, the sheet resistance Rs of TiOx thin films is ranged from 305 kΩ/square to 36 kΩ/square, temperature coefficient of resistance (TCR) value up to -2.12 %/K is obtained, optical band gap decreases from 3.34 eV to 3.28 eV. Through the analysis and discussion of the above experimental data, we could obtain the conclusion that the variation in substrate temperature during the sputtering deposition plays a considerable important role in the electrical and optical properties of all the deposited films.