13 October 2010 Design and fabrication of a far-infrared interferometer
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Proceedings Volume 7659, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials in Manufacturing and Testing; 765919 (2010); doi: 10.1117/12.868215
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
A far-infrared interferometer which can test ground surface is presented. Both theoretic analyses and experimental results show that the interferometer has the accuracy of λ/100 (RMS). This accuracy is able to meet the requirement of grinding primary mirror. In addition, the design and system performance of the infrared system is presented.
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Yongqian Wu, Yudong Zhang, Juan Zhang, "Design and fabrication of a far-infrared interferometer", Proc. SPIE 7659, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials in Manufacturing and Testing, 765919 (13 October 2010); doi: 10.1117/12.868215; https://doi.org/10.1117/12.868215
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KEYWORDS
Interferometers

Photovoltaics

Infrared radiation

Mirrors

Phase shifts

Surface finishing

Wavefronts

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