Properties of reactively sputtered nickel oxide films as a microbolometer sensing material

Dong Soo Kim; Il Woong Kwon; Chi Ho Hwang; Hee Chul Lee; Yong Soo Lee

doi:10.1117/12.850243

3 May 2010 Properties of reactively sputtered nickel oxide films as a microbolometer sensing material

Dong Soo Kim, Il Woong Kwon, Chi Ho Hwang, Hee Chul Lee, Yong Soo Lee

Proceedings Volume 7660, Infrared Technology and Applications XXXVI; 76601B (2010) https://doi.org/10.1117/12.850243
Event: SPIE Defense, Security, and Sensing, 2010, Orlando, Florida, United States

Abstract

This study investigates the feasibility of a reactively sputtered thin nickel oxide film for application to a microbolometer. The properties of the developed thin nickel oxide film depend on the sputter process parameters. The measured resistivity of the nickel oxide films ranges from 0.3 Ωcm to approximately 50 Ωcm. Negative Temperature Coefficient of Resistance (TCR) values as high as -3.3%/ °C were acquired. The feasible 1/f noise characteristic was also measured. The magnification of the TCR value and 1/f noise of the nickel oxide films was proportional to the resistivity of the nickel oxide films. Specifically, nickel oxide film with a high resistivity showed a higher TCR value and more 1/f noise. From the measured TCR and 1/f noise values, the theoretically calculated NETD showed a value suitable for use with a microbolometer. Additionally, an analysis of sputtered thin nickel oxide films was conducted through X-ray diffraction.

Citation Download Citation

Dong Soo Kim, Il Woong Kwon, Chi Ho Hwang, Hee Chul Lee, and Yong Soo Lee "Properties of reactively sputtered nickel oxide films as a microbolometer sensing material", Proc. SPIE 7660, Infrared Technology and Applications XXXVI, 76601B (3 May 2010); https://doi.org/10.1117/12.850243

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