3 May 2010 Properties of reactively sputtered nickel oxide films as a microbolometer sensing material
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Abstract
This study investigates the feasibility of a reactively sputtered thin nickel oxide film for application to a microbolometer. The properties of the developed thin nickel oxide film depend on the sputter process parameters. The measured resistivity of the nickel oxide films ranges from 0.3 Ωcm to approximately 50 Ωcm. Negative Temperature Coefficient of Resistance (TCR) values as high as -3.3%/ °C were acquired. The feasible 1/f noise characteristic was also measured. The magnification of the TCR value and 1/f noise of the nickel oxide films was proportional to the resistivity of the nickel oxide films. Specifically, nickel oxide film with a high resistivity showed a higher TCR value and more 1/f noise. From the measured TCR and 1/f noise values, the theoretically calculated NETD showed a value suitable for use with a microbolometer. Additionally, an analysis of sputtered thin nickel oxide films was conducted through X-ray diffraction.
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Dong Soo Kim, Dong Soo Kim, Il Woong Kwon, Il Woong Kwon, Chi Ho Hwang, Chi Ho Hwang, Hee Chul Lee, Hee Chul Lee, Yong Soo Lee, Yong Soo Lee, } "Properties of reactively sputtered nickel oxide films as a microbolometer sensing material", Proc. SPIE 7660, Infrared Technology and Applications XXXVI, 76601B (3 May 2010); doi: 10.1117/12.850243; https://doi.org/10.1117/12.850243
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