EO/IR Nanosensors are being developed for a variety of Defense and Commercial Systems Applications.
These include UV, Visible, NIR, MWIR and LWIR Nanotechnology based Sensors. The conventional
SWIR Sensors use InGaAs based IR Focal Plane Array (FPA) that operate in 1.0-1.8 micron region.
Similarly, MWIR Sensors use InSb or HgCdTe based FPA that is sensitive in 3-5 micron region. More
recently, there is effort underway to evaluate low cost SiGe visible and near infrared band that covers from
0.4 to 1.6 micron.
One of the critical technologies that will enhance the EO/IR sensor performance is the development of high
quality nanostructure based antireflection coating. Prof. Fred Schubert and his group have used the TiO2
and SiO2 graded-index nanowires / nanorods deposited by oblique-angle deposition, and, for the first time,
demonstrated their potential for antireflection coatings by virtually eliminating Fresnel reflection from an
AlN-air interface over the UV band. This was achieved by controlling the refractive index of the TiO2 and
SiO2 nanorod layers, down to a minimum value of n = 1.05, the lowest value so far reported.
In this paper, we will discuss our modeling approach and experimental results for using oblique angle
nanowires growth technique for extending the application for UV, Visible and NIR sensors and their utility
for longer wavelength application.