Application Of Halogenated Polymethylstyrenes To X-Ray Resists

Tsuguo Yamaoka; Mitsunobu Koshiba; Yoichi Kamoshida; Hideo Takahashi; Yoshiyuki Harita

doi:10.1117/12.940330

25 August 1987 Application Of Halogenated Polymethylstyrenes To X-Ray Resists

Tsuguo Yamaoka, Mitsunobu Koshiba, Yoichi Kamoshida, Hideo Takahashi, Yoshiyuki Harita

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940330
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

A series of chlorinated polymethylstyrenes (CPMSs) and brominated polymethylstyrenes (BPMSs) were synthesized by anionic polymerization of methylstyrene followed by radical halogenation. Radiation chemistry of CPMSs and BPMSs were investigated using RhLa X-rays as a radiation source. Resist sensitivity of CPMSs and BPMSs increases with increases in molecular weight and halogen content up to 90 unit% of halogenation. In addition, CPMSs have higher sensitivity than BPMSs toward RhLa X-rays. Infrared spectroscopic studies of radiation induced chemical reactions of the polymers showed that X-ray radiation caused the dissociation of C-X (Cl or Br) bonds and that the dissociation was much faster for CPMSs than BPMSs in spite of lower mass absorption coefficients of CPMSs. CPMS-5 (Mw=49x104, Cl cont.=92 unit%) exhibits the highest sensitivity of 15 mJ/cm2 (Dg) while maintaining high contrast value of 1.3. The patterning tests of CPMS-5 were done with a MICRONIX MX-15 which had a palladium source. As a result, 0.6 μm resist patterns were obtained despite its penumbral blurring being 0.35 μm. It is confirmed that CPMS-5 is one of the best X-ray resists from a practical point of view.

Citation Download Citation

Tsuguo Yamaoka, Mitsunobu Koshiba, Yoichi Kamoshida, Hideo Takahashi, and Yoshiyuki Harita "Application Of Halogenated Polymethylstyrenes To X-Ray Resists", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); https://doi.org/10.1117/12.940330

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available