Negative-Acting Aqueous Base-Developable Photoresist With Submicron Resolution Capabilities Over Topography

John J. Grunwald; William F. Cordes III; Giora Ben-Shushan; Chava Gal; Kathy Harding; Allen C. Spencer; Eitan Shalom

doi:10.1117/12.940340

25 August 1987 Negative-Acting Aqueous Base-Developable Photoresist With Submicron Resolution Capabilities Over Topography

John J. Grunwald, William F. Cordes III, Giora Ben-Shushan, Chava Gal, Kathy Harding, Allen C. Spencer, Eitan Shalom

Author Affiliations +

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940340
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

A family of negative-acting "image reversal" photoresists identified as the MacDermid XNR 2000 series is characterized here in some detail. Although its photoresist chemistry is based on the conventional positive resist concept using cresol Novolak resins together with a somewhat novel 2-1-4 naphthoquinone-diazo-oxide-ester, the conversion of the resist to the negative mode is primarily based on the addition of a new generation of thermal crosslinking agents to a typical positive resist formulation. The processing cycle evolved for this series consists of: (a) spin-coat, (b) soft-bake, (c) UV expose,(d) post-exposure-bake (PEB), and then (e) develop with either metal-ion containing or metal-ion-free developer(s) in either immersion or in-line mode(s).

Citation Download Citation

John J. Grunwald, William F. Cordes III, Giora Ben-Shushan, Chava Gal, Kathy Harding, Allen C. Spencer, and Eitan Shalom "Negative-Acting Aqueous Base-Developable Photoresist With Submicron Resolution Capabilities Over Topography", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); https://doi.org/10.1117/12.940340

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