12 May 2010 Micro-optical elements functioning in non-visible spectral range
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Nowadays novel micro-fabrication and wafer-based manufacturing approach allows realizing micro-optics in a way scientists have dreamt for generations, in particular, utilizing nano-imprint lithography as fabrication tooling enables greatly accelerating the micro-optics technology to its frontier. In this report, we present wafer-scale fabrication of various types of micro-optical elements based on photoresist, benzocyclobutene, photocurable imprint resist, and semiconductor materials by using thermal reflow, reactive ion etching, and imprint techniques. Especially, several concave or convex 3-dimensional micro-optical structures shaped by imprint method are detailed. These micro-optical elements can be monolithically or hybrid integrated onto optoelectronics devices, such as photodetectors and emitters as optical beam focuser, collimator, filter, or anti-reflectance elements. As application examples, polymer microlenses were integrated directly on the top of UV dual functional devices and quantum dot long wavelength infrared photodetectors, respectively.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qin Wang, Qin Wang, Andy Z. Z. Zhang, Andy Z. Z. Zhang, Andreas Bergström, Andreas Bergström, Vicky Z. J. Huo, Vicky Z. J. Huo, Susanne Almqvist, Susanne Almqvist, Wlodek Kaplan, Wlodek Kaplan, Jan Y. Andersson, Jan Y. Andersson, "Micro-optical elements functioning in non-visible spectral range", Proc. SPIE 7716, Micro-Optics 2010, 771609 (12 May 2010); doi: 10.1117/12.853959; https://doi.org/10.1117/12.853959


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