14 May 2010 Next-generation test equipment for micro-production
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The paper introduces different approaches to overcome the large ratio between wafer size and feature size in the testing step of micro production. For the inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS) a priori information are available to optimise the inspection process. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station and the fabrication of the first components are presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical interferometer design, micro-optical production, smart-pixel camera and mechanical design. Furthermore the first demonstrators are introduced and experimental results are presented.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kay Gastinger, Kay Gastinger, Lars Johnsen, Lars Johnsen, Malgorzata Kujawinska, Malgorzata Kujawinska, Michal Jozwik, Michal Jozwik, Uwe Zeitner, Uwe Zeitner, Peter Dannberg, Peter Dannberg, Jorge Albero, Jorge Albero, Sylwester Bargiel, Sylwester Bargiel, Christoph Schaeffel, Christoph Schaeffel, Stephan Beer, Stephan Beer, Rudolf Moosburger, Rudolf Moosburger, Patrick Lambelet, Patrick Lambelet, Marco Pizzi, Marco Pizzi, } "Next-generation test equipment for micro-production", Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77180F (14 May 2010); doi: 10.1117/12.855087; https://doi.org/10.1117/12.855087

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