New I-Line Lenses For Submicron Lithography

Setha G. Olson

doi:10.1117/12.967032

1 January 1987 New I-Line Lenses For Submicron Lithography

Setha G. Olson

Proceedings Volume 0772, Optical Microlithography VI; (1987) https://doi.org/10.1117/12.967032
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

New lenses for i-line lithography will be discussed. The advantages of shorter wavelengths for achieving higher resolution with greater depth of focus are well known. While prototype i-line (365nm wavelength) lenses have been available for several years, the field sizes were too small to be useful in production. Several lenses have become available recently which offer higher resolution and/or better field size. Among these are the Tropel 1635i and 2235i lenses, 5X lenses with numerical aperture of 0.35 and resolution of 0.8um. Field sizes are 16 and 22mm. Experimental data on resolution, depth of focus, CD control and image placement errors will be presented. In addition, several i-line resist processes will be discussed from the standpoint of optimum resolution with single layer processing.

Citation Download Citation

Setha G. Olson "New I-Line Lenses For Submicron Lithography", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967032

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available