Achievements Of Recent Research In Focused-Ion-Beam Technology

R. Aihara; H. Sawaragi

doi:10.1117/12.940377

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30 June 1987 Achievements Of Recent Research In Focused-Ion-Beam Technology

R. Aihara, H. Sawaragi

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Proceedings Volume 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI; (1987) https://doi.org/10.1117/12.940377
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The focused ion beam (FIB) technology has various applications such as microfabrication and micromachining. Two FIB systems, JIBL-106S and JIBL-150, which can perform pattern writing using pattern data from a CAD system have been developed. Both systems have the ability to produce actual devices. Using the FIB systems, various experiments have been performed, and some of the resutls have offered new fabrication processes of semiconductor devices.

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R. Aihara and H. Sawaragi "Achievements Of Recent Research In Focused-Ion-Beam Technology", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940377

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