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30 June 1987 Achievements Of Recent Research In Focused-Ion-Beam Technology
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Abstract
The focused ion beam (FIB) technology has various applications such as microfabrication and micromachining. Two FIB systems, JIBL-106S and JIBL-150, which can perform pattern writing using pattern data from a CAD system have been developed. Both systems have the ability to produce actual devices. Using the FIB systems, various experiments have been performed, and some of the resutls have offered new fabrication processes of semiconductor devices.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Aihara and H. Sawaragi "Achievements Of Recent Research In Focused-Ion-Beam Technology", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940377
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