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1 September 1987 A Polarization Diversity Surface Analysis System
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Abstract
A surface analysis system is described using an unconventional illumination approach. The optical system utilized incorporates two orthogonally polarized He-Ne lasers operating at 633nm. It is capable of sizing PSL (latex) particles on bare silicon wafers smaller than 0.2μm and provides first order differentiation between particles and defects. The scanning mechanisms are most similar to that used in optical disk drives. The optical system employs a dark-field microscope objective enabling the analysis of particles on transparent materials, such as glass, as well as on highly reflective materials such as silicon and dielectric mirrors. In addition to semiconductor wafer inspection, the new instrument can be configured to analyze polished memory disks, optical elements, and ring laser gyro mirrors.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert G. Knollenberg "A Polarization Diversity Surface Analysis System", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940384
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