Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials

Masayuki Endo; Masaru Sasago; Yoshihiko Hirai; Kazufumi Ogawa; Takeshi Ishihara

doi:10.1117/12.940399

1 September 1987 Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials

Masayuki Endo, Masaru Sasago, Yoshihiko Hirai, Kazufumi Ogawa, Takeshi Ishihara

Author Affiliations +

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940399
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

Citation Download Citation

Masayuki Endo, Masaru Sasago, Yoshihiko Hirai, Kazufumi Ogawa, and Takeshi Ishihara "Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940399

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