14 December 2010 Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA
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Proceedings Volume 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 774608 (2010) https://doi.org/10.1117/12.881702
Event: 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2010, Liptovsky Jan, Slovakia
Abstract
This contribution presents experimental results in the field of planar two-dimensional (2D) photonic crystal (PhC) structures, as well as their design, fabrication and analysis. We demonstrate maskless optical methods leading to fabrication of 2D PhC structures for applications in optoelectronics. The 2D PhC structures of square and triangular symmetries with period from 275 nm to 2 μm were fabricated in thin photoresist layer, III-V semiconductor surfaces and polymethylmethacrylate using interference lithography and near-field scanning optical microscope lithography. The 2D PhC structures prepared in GaAs surface were used as a mold for nanoimprint lithography in polymethylmethacrylate.
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Dušan Pudiš, Luboš Šušlik, Ivana Kubicová, Jaroslava Škriniarová, Ivan Martinček, "Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA", Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774608 (14 December 2010); doi: 10.1117/12.881702; https://doi.org/10.1117/12.881702
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