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14 December 2010 Laser source for interferometry in nanotechnology
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Proceedings Volume 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 77461I (2010) https://doi.org/10.1117/12.882151
Event: 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2010, Liptovsky Jan, Slovakia
Abstract
The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary etalon. This leads to the engagement of laser interferometric measuring methods. We present a design of a single-frequency stabilized laser which serves as a laser source for multiaxis position control of a nanopositioning stage. The laser stabilization technique is described together with comparison of frequency stability.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Hrabina, Josef Lazar, Ondrej Cip, and Martin Cizek "Laser source for interferometry in nanotechnology", Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 77461I (14 December 2010); https://doi.org/10.1117/12.882151
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