PHOTOMASK AND NGL MASK TECHNOLOGY XVII
13-15 April 2010
Yokohama, Japan
Front Matter
Proc. SPIE 7748, Front Matter: Volume 7748, 774801 (15 June 2010); doi: 10.1117/12.869338
Invited Papers Session
Proc. SPIE 7748, Perspectives of CMOS technology and future requirements, 774802 (25 May 2010); doi: 10.1117/12.864085
Proc. SPIE 7748, Actinic EUVL mask blank inspection capability with time delay integration mode, 774803 (26 May 2010); doi: 10.1117/12.867979
EUV Mask I
Proc. SPIE 7748, Effect of EUV exposure upon surface residual chemicals on EUV mask surface, 774804 (26 May 2010); doi: 10.1117/12.868292
Proc. SPIE 7748, Thin absorber EUV mask with light-shield border of etched multilayer and its lithographic performance, 774805 (27 May 2010); doi: 10.1117/12.867774
EUV Mask II
Proc. SPIE 7748, Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models, 774806 (26 May 2010); doi: 10.1117/12.866470
Proc. SPIE 7748, Defect inspection and repair performance comparisons between EUV and conventional masks, 774807 (26 May 2010); doi: 10.1117/12.867754
Proc. SPIE 7748, Inspecting EUV mask blanks with a 193-nm system, 774808 (26 May 2010); doi: 10.1117/12.865490
Nano Imprint and Patterned Media
Proc. SPIE 7748, Fabrication of ridge-and-groove servo pattern consisting of self-assembled dots for high-density bit patterned media, 774809 (26 May 2010); doi: 10.1117/12.863873
Proc. SPIE 7748, Defect reduction of patterned media templates and disks, 77480A (25 May 2010); doi: 10.1117/12.866882
Material and Process
Proc. SPIE 7748, The relationship between mounting pressure and time on final photomask flatness, 77480C (25 May 2010); doi: 10.1117/12.865005
Proc. SPIE 7748, Study of etching process for LER and resolution, 77480D (26 May 2010); doi: 10.1117/12.866417
Process and Repair
Proc. SPIE 7748, Preserving the mask integrity for the lithography process, 77480E (26 May 2010); doi: 10.1117/12.865881
Proc. SPIE 7748, Haze risk reduced mask manufacturing process, 77480F (25 May 2010); doi: 10.1117/12.864119
Proc. SPIE 7748, Through-pellicle defect repair for advanced photomasks, 77480G (25 May 2010); doi: 10.1117/12.865197
Pattern Generation
Proc. SPIE 7748, eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below, 77480H (26 May 2010); doi: 10.1117/12.866350
Proc. SPIE 7748, Evaluation of a next generation EB mask writer for hp 32nm lithography, 77480I (26 May 2010); doi: 10.1117/12.866750
Proc. SPIE 7748, Mask writing time explosion and its effect on CD control in e-beam lithography, 77480J (26 May 2010); doi: 10.1117/12.868264
Metrology and Inspection
Proc. SPIE 7748, The fusion of metrology and inspection: challenges and solutions, 77480K (26 May 2010); doi: 10.1117/12.866849
Proc. SPIE 7748, Advanced mask-to-mask overlay analysis for next generation technology node reticles, 77480L (28 May 2010); doi: 10.1117/12.867720
Proc. SPIE 7748, PROVE, the next generation registration metrology tool: status report, 77480M (26 May 2010); doi: 10.1117/12.867913
Proc. SPIE 7748, New critical dimension uniformity measurement concept based reticle inspection tool, 77480N (26 May 2010); doi: 10.1117/12.864109
Proc. SPIE 7748, Evaluation of metrology capabilities of mask inspection equipment, 77480O (26 May 2010); doi: 10.1117/12.867221
Proc. SPIE 7748, Computational inspection applied to a mask inspection system with advanced aerial imaging capability, 77480P (26 May 2010); doi: 10.1117/12.868053
Proc. SPIE 7748, Productivity improvement of high resolution inspection mode on TeraScan 597XR, 77480Q (26 May 2010); doi: 10.1117/12.867983
Mask-related Lithography
EDA, DFM, and MDP
Proc. SPIE 7748, Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count, 77480X (27 May 2010); doi: 10.1117/12.866971
Proc. SPIE 7748, Extraction and utilization of the repeating patterns for CP writing in mask making, 77480Y (25 May 2010); doi: 10.1117/12.864285
Poster Session: Material and Process
Proc. SPIE 7748, Two-fluid cleaning technology for advanced photomask, 77480Z (27 May 2010); doi: 10.1117/12.867980
Proc. SPIE 7748, Evaluation of easily removable pellicle adhesive, 774810 (25 May 2010); doi: 10.1117/12.865042
Proc. SPIE 7748, New type of haze formation on masks fabricated with Mo-Si blanks, 774811 (25 May 2010); doi: 10.1117/12.864478
Proc. SPIE 7748, Pinhole defect study and process optimization, 774812 (27 May 2010); doi: 10.1117/12.867968
Proc. SPIE 7748, Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT software, 774813 (27 May 2010); doi: 10.1117/12.868147
Poster Session: Pattern Generation
Proc. SPIE 7748, Performance and stability of mask process correction for EBM-7000, 774814 (27 May 2010); doi: 10.1117/12.867969
Proc. SPIE 7748, W-CMOS blanking device for projection multibeam lithography, 774815 (27 May 2010); doi: 10.1117/12.865478
Proc. SPIE 7748, Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system, 774816 (25 May 2010); doi: 10.1117/12.864286
Proc. SPIE 7748, Monitor technology of outer circumstances for mask EB writing system, 774817 (25 May 2010); doi: 10.1117/12.864043
Proc. SPIE 7748, Practical resist model calibration for e-beam direct write processes, 774818 (27 May 2010); doi: 10.1117/12.866695
Proc. SPIE 7748, Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device, 774819 (27 May 2010); doi: 10.1117/12.868174
Poster Session: Metrology and Inspection
Proc. SPIE 7748, The large contour data generation from divided image of photomask pattern of 32 nm and beyond, 77481A (27 May 2010); doi: 10.1117/12.866056
Proc. SPIE 7748, Study on counting error in particle inspection, 77481B (27 May 2010); doi: 10.1117/12.867929
Proc. SPIE 7748, Assessing equipment and process related electrostatic risks to reticles with E-Reticle system, 77481C (27 May 2010); doi: 10.1117/12.866487
Proc. SPIE 7748, Large scale flash memory system (LSFMS) for photomask defect inspection machine, 77481D (27 May 2010); doi: 10.1117/12.864177
Proc. SPIE 7748, Compensating for image placement errors for the HP 3X nm node, 77481E (27 May 2010); doi: 10.1117/12.867721
Proc. SPIE 7748, Increased productivity of repair verification by offline analysis of aerial images, 77481F (27 May 2010); doi: 10.1117/12.863806
Proc. SPIE 7748, Mask inspection system with variable sensitivity and printability verification function, 77481G (25 May 2010); doi: 10.1117/12.864415
Poster Session: Repair
Proc. SPIE 7748, Nanomachining of non-orthogonal mask patterns, 77481H (27 May 2010); doi: 10.1117/12.865198
Proc. SPIE 7748, FIB-CVD technology for EUV mask repair, 77481I (27 May 2010); doi: 10.1117/12.867233
Proc. SPIE 7748, Future application of e-beam repair tool beyond 3X generation, 77481J (25 May 2010); doi: 10.1117/12.864098
Poster Session: EDA, DFM, and MDP
Proc. SPIE 7748, A novel pattern error detecting algorithm for SEM images of mask monitoring patterns, 77481L (27 May 2010); doi: 10.1117/12.866273