Defect reduction of patterned media templates and disks

Kang Luo; Steven Ha; John Fretwell; Rick Ramos; Zhengmao Ye; Gerard Schmid; Dwayne LaBrake; Douglas J. Resnick; S. V. Sreenivasan

doi:10.1117/12.866882

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24 May 2010 Defect reduction of patterned media templates and disks

Kang Luo, Steven Ha, John Fretwell, Rick Ramos, Zhengmao Ye, Gerard Schmid, Dwayne LaBrake, Douglas J. Resnick, S. V. Sreenivasan

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Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77480A (2010) https://doi.org/10.1117/12.866882
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

Imprint lithography has been shown to be an effective technique for the replication of nano-scale features. Acceptance of imprint lithography for manufacturing will require a demonstration of defect levels commensurate with cost-effective device production. This work summarizes the results of defect inspections of hard disks patterned using Jet and Flash Imprint Lithography (J-FIL^TM). Inspections were performed with optical based automated inspection tools. For the hard drive market, it is important to understand the defectivity of both the template and the imprinted disk. This work presents a methodology for automated pattern inspection and defect classification for imprint-patterned media. Candela CS20 and 6120 tools from KLA-Tencor map the optical properties of the disk surface, producing highresolution grayscale images of surface reflectivity and scattered light. Defects that have been identified in this manner are further characterized according to the morphology. The imprint process was tested after optimizing both the disk cleaning and adhesion layers processes that precede imprinting. An extended imprint run was performed and both the defect types and trends are reported.

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Kang Luo, Steven Ha, John Fretwell, Rick Ramos, Zhengmao Ye, Gerard Schmid, Dwayne LaBrake, Douglas J. Resnick, and S. V. Sreenivasan "Defect reduction of patterned media templates and disks", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480A (24 May 2010); https://doi.org/10.1117/12.866882

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