26 May 2010 Large scale flash memory system (LSFMS) for photomask defect inspection machine
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Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481D (2010) https://doi.org/10.1117/12.864177
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan
Abstract
Concept of asynchronous DB defects inspection machine was contrived to the purpose of reducing the price which had large scale flash memory buffer. This memory buffer was located in between reference data rendering computer and scanner; also it was located in scanner and image computer. As first step to make the concept model real, an experimental system was built which had virtual scanner.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Satoshi Yamamoto, Satoshi Yamamoto, Ravi Pai, Ravi Pai, Manish Ranade, Manish Ranade, Soumen Mondal, Soumen Mondal, Sundeep Prabhu, Sundeep Prabhu, Gen Kurosaki, Gen Kurosaki, } "Large scale flash memory system (LSFMS) for photomask defect inspection machine", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481D (26 May 2010); doi: 10.1117/12.864177; https://doi.org/10.1117/12.864177
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