26 May 2010 Increased productivity of repair verification by offline analysis of aerial images
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Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481F (2010) https://doi.org/10.1117/12.863806
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan
Using AIMSTM to qualify repairs of defects on photomasks is the industry standard. AIMSTM provides a reasonable matching of lithographic imaging performances without the need of wafer prints. The need of utilisation of this capability by photomask manufacturers has risen due to the increased complexity of layouts incorporating aggressive RET and phase shift technologies as well as tighter specifications have pushed aerial image metrology to consider CD performance results in addition to the traditional intensity verification. The content of the paper describes the utilisation of the AIMSTM Repair Verification (RV) software for the verification of aerial images in a mask shop production environment. The software is used to analyze images from various AIMSTM tool generations and the two main routines, Multi Slice Analysis (MSA) and Image Compare (IC), are used to compare defective and non-defective areas of aerial images. It is detailed how the RV software cleans "non real" errors potentially induced by operator misjudgements, thus providing accurate and repeatable analyses all proven against the results achieved manually. A user friendly GUI drives the user through few simple, fast and safe operations and automatically provides summary tables containing all the relevant results of the analysis that can be easily exported in a proper format and sent out to the customer as a technical documentation. This results in a sensible improvement of the throughput of the printability evaluation process in a mask manufacturing environment, providing reliable analyses at a higher productivity.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ernesto Villa, Ernesto Villa, Luca Sartelli, Luca Sartelli, Hiroyuki Miyashita, Hiroyuki Miyashita, Thomas Scheruebl, Thomas Scheruebl, Rigo Richter, Rigo Richter, Thomas Thaler, Thomas Thaler, } "Increased productivity of repair verification by offline analysis of aerial images", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481F (26 May 2010); doi: 10.1117/12.863806; https://doi.org/10.1117/12.863806


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