26 May 2010 Nanomachining of non-orthogonal mask patterns
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Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481H (2010) https://doi.org/10.1117/12.865198
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan
Patterns which are not aligned to standard orthogonal (x and y ordinate) directions have recently been developed for advanced lithography nodes. Efforts have been successful in developing single pass nanomachining repair processes to meet the printability requirements for these patterns. This development makes use of the latest improvements made to the COBRA repair process (the Enhanced COBRA process typically completed in less than 2 minutes of repair time) with symmetric NanoBits to repair opposing critical edges of bridging defects. It also required fundamental changes in the software tools to allow automated detection of the angle of the edges and the application of pre-programmed repair edge biases normal (90°) to the detected angled edges. Additionally, some other new improvements (hardware, software, and process) are reviewed in light of more traditional nanomachining repairs.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tod Robinson, Tod Robinson, Daniel Yi, Daniel Yi, Roy White, Roy White, Ron Bozak, Ron Bozak, Mike Archuletta, Mike Archuletta, David Lee, David Lee, } "Nanomachining of non-orthogonal mask patterns", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481H (26 May 2010); doi: 10.1117/12.865198; https://doi.org/10.1117/12.865198


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