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Sungho Jun, Yeon-Ah Shim, Jaeyoung Choi, Kwangsun Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, KiHo Baik, "Improvement of KrF contact layer by inverse lithography technology with assist feature," Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481V (27 May 2010);