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17 April 1987 Microscop.Yap.Piied To Cirs,Registration And Inspection
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Abstract
Realtime digital image processing of highly magnified optical images - Digital Microscopy - provides the basis for dramatic improvements in the rapid and repeatable acquisition of key process control information - CD's, registration, defect data. Metrology: Wafer and mask features down to .25u can now be repeatably measured optically. Techniques used in extending the minimum optical width measurement from ~l-1.5ji to .25|i will be discussed. Registration: Mask to wafer registration and layer to layer registration can now be measured with a standard deviation of .0033ji using box within a box or similar patterns. Inspection: High speed comparison to "golden" images stored in memory gives a quick look capability in addition to more extensive defect detection and coordinate determination capability. A variety of image processing functions will be discussed.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Yansen, J. Sardella, F. Madison, and P. Knutrud "Microscop.Yap.Piied To Cirs,Registration And Inspection", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940419; https://doi.org/10.1117/12.940419
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