15 November 2010 Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter
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Proceedings Volume 7751, XVIII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 77511V (2010) https://doi.org/10.1117/12.881321
Event: 18th International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2010, Sofia, Bulgaria
Abstract
We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n~2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO2particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.
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Minoru Obara, Yuto Tanaka, Go Obara, Akira Zenidaka, Mitsuhiro Terakawa, "Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter", Proc. SPIE 7751, XVIII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 77511V (15 November 2010); doi: 10.1117/12.881321; https://doi.org/10.1117/12.881321
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