Nanostructured antistatic and antireflective thin films made of indium tin oxide and silica over-coat layer

Young-Sang Cho; Jeong-Jin Hong; Seung-Man Yang; Chul-Jin Choi

doi:10.1117/12.861137

23 August 2010 Nanostructured antistatic and antireflective thin films made of indium tin oxide and silica over-coat layer

Young-Sang Cho, Jeong-Jin Hong, Seung-Man Yang, Chul-Jin Choi

Author Affiliations +

Proceedings Volume 7766, Nanostructured Thin Films III; 77660H (2010) https://doi.org/10.1117/12.861137
Event: SPIE NanoScience + Engineering, 2010, San Diego, California, United States

Abstract

Stable dispersion of colloidal indium tin oxide nanoparticles was prepared by using indium tin oxide nanopowder, organic solvent, and suitable dispersants through attrition process. Various comminution parameters during the attrition step were studied to optimize the process for the stable dispersion of indium tin oxide sol. The transparent and conductive films were fabricated on glass substrate using the indium tin oxide sol by spin coating process. To obtain antireflective function, partially hydrolyzed alkyl silicate was deposited as over-coat layer on the pre-fabricated indium tin oxide film by spin coating technique. This double-layered structure of the nanostructured film was characterized by measuring the surface resistance and reflectance spectrum in the visible wavelength region. The final film structure was enough to satisfy the TCO regulations for EMI shielding purposes.

Citation Download Citation

Young-Sang Cho, Jeong-Jin Hong, Seung-Man Yang, and Chul-Jin Choi "Nanostructured antistatic and antireflective thin films made of indium tin oxide and silica over-coat layer", Proc. SPIE 7766, Nanostructured Thin Films III, 77660H (23 August 2010); https://doi.org/10.1117/12.861137

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