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23 August 2010 Fabrication of nanostructured aluminium thin film and in-situ monitoring of the growth
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Ultrathin nanostructured metal films exhibit unusual properties and performances. Film functional properties depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions. Hence, in order to control the nanostructure of aluminium thin film fabricated by RF magnetron sputtering, we focus on in-situ monitoring of electrical and optical properties of the growing layer as well as plasma characterization by mass and optical emission spectroscopy. The electrical conductivity and I-V characteristics were measured. The optical constants were obtained from optical monitoring based on a spectral ellipsometry. The relevant models (based on one or two Lorentz oscillators and B-spline function) are suggested to evaluate the data obtained from the monitoring techniques. The results of the in-situ monitoring are correlated with SEM analyses. We demonstrate the monitoring can distinguish the growth mode in the real-time. We can estimate the percolation threshold of the growing layer and control layer nanostructure. We show that the nanostructure can be manipulated by RF power variation. Optical functions exhibiting plasmonic behaviour in the UV range and a strong nonlinear course of I-V curves were obtained for ultrathin Al film deposited at lower growth rate.
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M. Novotny, J. Bulir, J. Lancok, P. Pokorny, M. Bodnar, and K. Piksova "Fabrication of nanostructured aluminium thin film and in-situ monitoring of the growth", Proc. SPIE 7766, Nanostructured Thin Films III, 77660U (23 August 2010);

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