Instrumentation, Metrology, and Standards for Nanomanufacturing IV
Editor(s): Michael T. Postek
Proceedings Volume 7767 is from: Logo
1-5 August 2010
San Diego, California, United States
Front Matter
Proc. SPIE 7767, Front Matter: Volume 7767, 776701 (8 October 2010); doi: 10.1117/12.869880
Nanomanufacturing Metrology I
Proc. SPIE 7767, Fabrication of 3D nanostructures with lithographically patterned surfaces by self-folding, 776704 (24 August 2010); doi: 10.1117/12.859688
Proc. SPIE 7767, Development of a high-speed profilometer for manufacturing inspection, 776705 (24 August 2010); doi: 10.1117/12.860166
Instrumentation and Metrology I
Proc. SPIE 7767, Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth, 776707 (24 August 2010); doi: 10.1117/12.860581
Proc. SPIE 7767, Assessment of the mechanical integrity of silicon and diamond-like-carbon coated silicon atomic force microscope probes, 776708 (24 August 2010); doi: 10.1117/12.861789
Nanometrology: Standards
Proc. SPIE 7767, Reference metrology for nanotechnology: significance, challenges and solutions, 77670C (24 August 2010); doi: 10.1117/12.860666
Proc. SPIE 7767, Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820, 77670D (24 August 2010); doi: 10.1117/12.861595
Proc. SPIE 7767, Conductive carbon nanotubes for semiconductor metrology, 77670F (15 September 2010); doi: 10.1117/12.861315
Instrumentation and Metrology II
Proc. SPIE 7767, Step height measurement by using heterodyne central fringe identification technique, 77670J (24 August 2010); doi: 10.1117/12.860356
Proc. SPIE 7767, Readjusting image sharpness by numerical parametric lenses in Forbes-representation and Halton sampling for selective refocusing in digital holographic microscopy, 77670K (24 August 2010); doi: 10.1117/12.860695
Instrumentation and Metrology III
Proc. SPIE 7767, Limits of IR-spectrometers based on linear variable filters and detector arrays, 77670L (24 August 2010); doi: 10.1117/12.860532
Proc. SPIE 7767, Spectral response of photopic instruments with traceability to lamps, 77670M (24 August 2010); doi: 10.1117/12.860898
Proc. SPIE 7767, Applications of Mueller polarimetry in the Fourier space for overlay characterization in microelectronics, 77670N (24 August 2010); doi: 10.1117/12.862976
Proc. SPIE 7767, 3D metrology system with internal calibration, 77670O (24 August 2010); doi: 10.1117/12.863599
Poster Session
Proc. SPIE 7767, Using chromatic confocal apparatus for in situ rolling thickness measurement in hot embossing process, 77670P (24 August 2010); doi: 10.1117/12.860565
Proc. SPIE 7767, Magnetic measurement of pulsed laser-induced nanomagnetic arrays using Surface Magneto-Optic Kerr Effect, 77670Q (24 August 2010); doi: 10.1117/12.861004
Proc. SPIE 7767, A proposal to solve the problem of lack of concordance in the measurement of temperature when using different radiators, 77670R (24 August 2010); doi: 10.1117/12.860748
Proc. SPIE 7767, An overlapping technique to measure the parallelism of surface elements in a large area based on comparison goniometer, 77670S (15 September 2010); doi: 10.1117/12.860077
Proc. SPIE 7767, Linewidth control for optical heterodyne beat of 850-nm vertical cavity surface emitting lasers, 77670U (24 August 2010); doi: 10.1117/12.860052
Proc. SPIE 7767, Investigation of the metrological properties of a 3-D microprobe with optical detection system, 77670V (25 August 2010); doi: 10.1117/12.863118
Proc. SPIE 7767, Readjusting image sharpness by numerical parametric lenses in Forbes-representation and Halton sampling for selective refocusing in digital holographic microscopy - Errata, 77670W (20 June 2011); doi: 10.1117/12.903693
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