Contaminant film deposition on VUV-modified surfaces

Dianne J. Coleman; Kenneth T. Luey

doi:10.1117/12.860729

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7 September 2010 Contaminant film deposition on VUV-modified surfaces

Dianne J. Coleman, Kenneth T. Luey

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Proceedings Volume 7794, Optical System Contamination: Effects, Measurements, and Control 2010; 779409 (2010) https://doi.org/10.1117/12.860729
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

Mechanisms for molecular contaminant droplet formation are investigated. The tendency for droplet formation is evaluated in terms of the surface tension of the liquid-like outgassed species and the surface energy of the collector. Results are presented indicating that VUV irradiation of the surface prior to contaminant deposition eliminates some droplet formation completely. This finding is discussed in terms of the removal of hydrocarbon and carbonyl-structured compounds from oxidized silicon surfaces.

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Dianne J. Coleman and Kenneth T. Luey "Contaminant film deposition on VUV-modified surfaces", Proc. SPIE 7794, Optical System Contamination: Effects, Measurements, and Control 2010, 779409 (7 September 2010); https://doi.org/10.1117/12.860729

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