Comparison of measured and analytical ultraviolet light attenuation

Jack T. Sanders

doi:10.1117/12.862165

7 September 2010 Comparison of measured and analytical ultraviolet light attenuation

Jack T. Sanders

Proceedings Volume 7794, Optical System Contamination: Effects, Measurements, and Control 2010; 77940R (2010) https://doi.org/10.1117/12.862165
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

Ultraviolet light attenuation was measured by the Martin Marietta Corporation in 1980 between the wavelengths of approximately 115 nanometers to 300 nanometers. These data are compared to the light attenuation calculated using x-ray interactions with matter, pioneered by the Lawrence Berkley National Laboratories. The Center for X-Ray Optics provides a methodology to calculate light attenuation from x-ray light to 124-nm ultraviolet light. There is a slight overlap in the data, allowing for a comparison of commonly outgassed species from the base materials reported in the Martin Marietta document.

Citation Download Citation

Jack T. Sanders "Comparison of measured and analytical ultraviolet light attenuation", Proc. SPIE 7794, Optical System Contamination: Effects, Measurements, and Control 2010, 77940R (7 September 2010); https://doi.org/10.1117/12.862165

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